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Wafer UV Photoresist Curing Machine 3

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Wafer UV Photoresist Curing Machine

> The design of the reflected light path of each lamp tube, the uniformity of the illumination at 5 points with a diameter of 300mm and more than 80%.

> Anti-light leakage safety design, no light leakage after the double-open gate is closed.

> Illumination monitoring design, which can dynamically monitor illuminance during production.

> Modular design of irradiation light box, can be used with current EFEM system.

> PC BASE MMI interface, A. production statistics management list, B. lamp illuminance / life management list.

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Wafer Photoresister UV Curing Machine 1233249