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Wafer Photoresister UV Curing Machine 4

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  • Wafer UV Photoresist Curing Machine

    > The design of the reflected light path of each lamp tube, the uniformity of the illumination at 5 points with a diameter of 300mm and more than 80%.

    > Anti-light leakage safety design, no light leakage after the double-open gate is closed.

    > Illumination monitoring design, which can dynamically monitor illuminance during production.

    > Modular design of irradiation light box, can be used with current EFEM system.

    > PC BASE MMI interface, A. production statistics management list, B. lamp illuminance / life management list.